First attempt at lithography simulation of the 1RW bitcell array poly using
DimmiLitho (with a bunch of hacks/fixes).
Right now, this is NOT using the OPC but instead using its own ILT-generated OPC.
Set the NA to 0.69 which seems reasonable for 130nm from what I've seen. Not sure about the other parameters for the resist, lens, etc.
Left: Mask
Mid: Exposure intensity
Right: ILT Mask