First attempt at lithography simulation of the 1RW bitcell a

Question

First attempt at lithography simulation of the 1RW bitcell array poly using <https github com vincentlv DimmiLitho|DimmiLitho> with a bunch of hacks fixes Right now this is NOT using the OPC but instead using its own ILT generated OPC Set the NA to 0 69 which seems reasonable for 130nm from what I ve seen Not sure about the other parameters for the resist lens etc Left Mask Mid Exposure intensity Right ILT Mask

Matthew Guthaus · Answer

The LI layer gets a bit more complicated

Matthew Guthaus · Answer

This is poly and LI with the OPC from Skywater

Matthew Guthaus · Answer

It s hard to tell but there is some difference in the exposure

Tim Edwards · Answer

< U0175T39732> This is very cool What are you doing with the software hacks and fixes Is the project active Can you do a pull request

Matthew Guthaus · Answer

< U016EM8L91B> I m planning to 1 They have a hacky gds parser that ignores the database units and scale in gds 2 it assumes that the pattern is tiled or with a percentage of width height boundary I added an option to use a bounding box option but then realized the array has orientation changes as well so changed to a small array 3 it needs to use add drop mask layers with boolean operations I manually did the add layers and this one didn t have drop but the diff layer has both add and drop layers

Matthew Guthaus · Answer

4 the intensity doesn t account for the resist and so on They use those models for the ILT but not the simulation So I need to add that too