First attempt at lithography simulation of the 1RW bitcell array poly using DimmiLitho (with a bunch of hacks/fixes). Right now, this is NOT using the OPC but instead using its own ILT-generated OPC. Set the NA to 0.69 which seems reasonable for 130nm from what I've seen. Not sure about the other parameters for the resist, lens, etc. Left: Mask Mid: Exposure intensity Right: ILT Mask

@User: This is very cool. What are you doing with the software hacks and fixes? Is the project active? Can you do a pull request?

@User I'm planning to. 1) They have a hacky gds parser that ignores the database units and scale in gds. 2) it assumes that the pattern is tiled or with a percentage of width/height boundary. I added an option to use a bounding box option but then realized the array has orientation changes as well so changed to a small array. 3) it needs to use add/drop mask layers with boolean operations. I manually did the add layers and this one didn't have drop, but the diff layer has both add and drop layers.