#124 LVS updates Pull request opened by atorkmabrains LVS Updates • Updating CHIP boundary and pwell to be hierarchically derived. • Cleaned various LVS derivations for better performance. • Added additional logs to improve LVS run tracking and debugging. • Enhanced the functionality of the LVS reader. • Updating run script to handle

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symbol in paths and set deep run mode as default. • Added more cells to the regression to test both deep and flat runs. • Modified FETs and RFFETs derivations to utilize labels for recognition. • Added support for case-insensitive pattern matching in all LVS patterns. • Updating all layers definitions to exclude NODRC marker layer as in commercial LVS. • Updating activ, poly and metals derivations to match commercial LVS.. (Include fillers, Exclude slit). • Updating indcutor3 derivations to use restricted pins construction as in commercial LVS. • Supporting all substrate types for inductors, ignoring pwell block from inductors recognition. • Updating ESD devices to get priority over diodes. • Updating git actions to be triggered only for LVS changes. IHP-GmbH/IHP-Open-PDK ✅ All checks have passed 13/13 successful checks

@Krzysztof Herman @Sergei Andreev Could you please merge?

#124 LVS updates Pull request merged by KrzysztofHerman IHP-GmbH/IHP-Open-PDK